Major 

Gaseous Electronics, Plasma Engineering
 
 
 Research Interests

High Density Plasma Sources

Plasma Display Panel

  
 
 Education 

Ph.D., Seoul National University, Korea, 1996
 
 
 Selected Publications 
  1. Lee, H. J., and Tae, H. S., "A Study on the Characteristics of Axially Magnetized Capacitively Coupled Radio Frequency Plasma," Journal of KVS, 2001(in Press).

2. Kim, M. Y., Tae, H. S., and Lee, H. J., "Effects of Etch Process Parameters on the Ohmic Contact Formation in the Plasma Etching of GaN Using Plana Inductively Coupled CH4/H2/Ar Plasma," Journal of KIEE Vol. 49C No. 8-2 pp. 438-444, 2000.

3. Lee, H. J., "Electric Field in a Magnetized Inductively Coupled Plasma," IEEE Transactions on Plasma Science, Vol. 27. Issue 1 pp. 52-53, 1999.

4. Lee, H. J., Motomura, M., Tachibana, K., "Observations of Silicon Surfaces Exposed to Inductively Coupled CHF3 and C4F8/H2 Plasmas Using Fourier Transform Infrared Ellipsometry," Japanese Journal of Applied Physics, Vol.37 Part 1, No. 8 pp.4522-4526, 1998.

5. Lee, H. J., Kim, J. H., and Whang, K. W., "Selective SiO2/Si3N4 Etching In Magnetized Inductively Coupled C4F8 Plasma," Journal of Vacuum Science & Technology B, 16(2), pp. 500, 1998.

  
 
 Professional Experiences 

Assistant Professor, Pusan National University, Korea (2001-Present)

Instructor, Uiduk University, Korea (1999-2001)

Researcher, Kyungpook National University, Korea (1998 -1999)

Instructor, Kyoto University, Japan (1996-1998)

  
 
 Professional Societies & Activities 

Member, KIEE, AVS, KVS
  
 
 Honors and Awards 

  
 
 International Joint Research & Activities